Metallic Nanowires by Full Wafer Stencil LithographyReport as inadecuate




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Published in: Nano Letters, vol. 8, num. 11, p. 3675-3682 Publication date: 2008

Aluminum and gold nanowires were fabricated using 100 mm stencil wafers containing nanoslits fabricated with a focused ion beam. The stencils were aligned and the nanowires deposited on a substrate with predefined electrical pads. The morphology and resistivity of the wires were studied. Nanowires down to 70-nm wide and 5 µm long have been achieved showing a resistivity of 10 µΩcm for Al and 5 µΩcm for Au and maximum current density of  108 A/cm2. This proves the capability of stencil lithography for the fabrication of metallic nanowires on a full wafer scale.

Keywords: Stencil lithography ; metallic nanowires ; resistivity Reference LMIS1-ARTICLE-2008-040doi:10.1021/nl801778tView record in Web of Science





Author: Vazquez Mena, Oscar; Villanueva, Guillermo; Savu, Veronica; Sidler, Katrin; van den Boogaart, M. A. F.; Brugger, Juergen

Source: https://infoscience.epfl.ch/record/126331?ln=en







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