EXPERIMENTAL AND THEORETICAL DEPOSITION PROFILES FOR STATIC AND DYNAMIC PCVD WITH WF6-H2 AND-OR ORGANOMETALLIC STARTING COMPOUNDSReport as inadecuate




EXPERIMENTAL AND THEORETICAL DEPOSITION PROFILES FOR STATIC AND DYNAMIC PCVD WITH WF6-H2 AND-OR ORGANOMETALLIC STARTING COMPOUNDS - Download this document for free, or read online. Document in PDF available to download.



Abstract : Static and dynamic deposition profiles by plasma-activated CVD from WF6-H2 and-or Th-β-dicétonate starting compounds in an Ar-O2 gas mixture l, 2 have been investigated. The plasma was realized as dc glow discharge between a movable central anode and coaxially stacked substrate cylinders serving as cathode in a quartz reactor. The aim of these activities is to optimize e.g. ThO2 doped W layer structures for cathode applications. Static and dynamic PCVD thickness or concentration profiles were then fitted to a theory formulated originally for SiO2 PCVD with a microwave plasma 3, 4, 5. From a computer fit of the static profiles, bimolecular reaction rate constants in the order of 10-l5 to 3.10-14 cm3 -sec were determined for the first time for the above reactants discharge powers between 107 and 310 Watt. Using the known static profiles, dynamic profiles can then be predicted and compared with the experimental results. Criteria for a constant dopant concentration and thickness region -plateau- and for obtaining the right phase composition despite F-content and carbon-rich organometallic starting compounds are discussed.





Author: G. Gärtner P. Janiel F. Weling

Source: https://hal.archives-ouvertes.fr/



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