DEVELOPMENT OF BORON AND PHOSPHORUS LIQUID-METAL-ION SOURCESReport as inadecuate




DEVELOPMENT OF BORON AND PHOSPHORUS LIQUID-METAL-ION SOURCES - Download this document for free, or read online. Document in PDF available to download.



Abstract : Boron B and phosphorus P liquid-metal-ion LMI sources have been developed for maskless implantation in silicon. The B-LMI source, which employs a carbon or carbide emitter and a Ni-B base alloy as its source material, has a life time of more than 250 hours. The P-LMI source utilizing a Cu-P alloy achieves a life time of more than 20 hours. The ions emitted from these sources are investigated by mass and energy analyses. Isotope effect has been observed for B ion emission with a B-LMI source. Focused B+ implantation in Si was preliminarily carried out using a mass-separated microbeam column.





Author: T. Ishitani K. Umemura Y. Kawanami H. Tamura

Source: https://hal.archives-ouvertes.fr/



DOWNLOAD PDF




Related documents