Growth of Silver Nanoparticles by DC Magnetron SputteringReport as inadecuate




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Journal of NanomaterialsVolume 2012 2012, Article ID 963609, 8 pages

Research Article

Applied Nanotechnology Laboratory ANT Lab, Department of Physics, King Mongkut’s University of Technology Thonburi, Bangkok 10140, Thailand

Department of Physics, Faculty of Science, Burapha University, Chonburi 20131, Thailand

Thailand Center of Excellence in Physics, CHE, Ministry of Education, Bangkok 10400, Thailand

Received 13 May 2012; Accepted 27 June 2012

Academic Editor: Zhenhui Kang

Copyright © 2012 P. Asanithi et al. This is an open access article distributed under the Creative Commons Attribution License, which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.

Abstract

Silver Ag nanoparticles are of great interest for many applications. However, their fabrications have been limited by the synthesis methods in which size, shape, and aggregation are still difficult to control. Here, we reported on using direct current DC magnetron sputtering for growing Ag nanoparticles on unheated substrates. Effects of sputtering condition on grain size of Ag nanoparticle were discussed. At constant sputtering current and deposition time, the average sizes of Ag nanoparticles were 5.9 ± 1.8, 5.4 ± 1.3, and 3.8 ± 0.7 nm for the target-substrate distances of 10, 15, and 20 cm, respectively. The morphology evolution from nanoparticles to wormlike networks was also reported. High-resolution transmission electron microscopy image represented clear lattice fringes of Ag nanoparticles with a d-spacing of 0.203 nm, corresponding to the 200 plane. The technique could be applied for growth of nanoparticles that were previously difficult to control over size and size uniformity.





Author: P. Asanithi, S. Chaiyakun, and P. Limsuwan

Source: https://www.hindawi.com/



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