SURFACE CONDITIONING EFFECT ON VACUUM MICROELECTRONICS COMPONENTS FABRICATED BY DEEP REACTIVE ION ETCHINGReport as inadecuate




SURFACE CONDITIONING EFFECT ON VACUUM MICROELECTRONICS COMPONENTS FABRICATED BY DEEP REACTIVE ION ETCHING - Download this document for free, or read online. Document in PDF available to download.

1 ESYCOM - Electronique, Systèmes de communication et Microsystèmes 2 THALES Airborne Systems Elancourt

Abstract : Advances in material processing such as silicon micromachining are opening the way to vacuum microelectronics. Two-dimensional vacuum components can be fabricated using the microsystems processes. We developed such devices using a single metal layer and silicon micromachining by DRIE. The latter technological step has significant impact on the characteristics of the vacuum components. This paper presents a brief summary of electron emission possibilities and the design leading to the fabrication of a lateral field emission diode. First measurement results and the aging of the devices are also discussed.

Keywords : Field Emission Micromachining Surface Conditioning DRIE





Author: A. Phommahaxay - G. Lissorgues - L. Rousseau - T. Bourouina - P. Nicole -

Source: https://hal.archives-ouvertes.fr/



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