PREPARATION AND CHARACTERIZATION OF Ge-Si ALLOYS CARRIED OUT BY MOCVDReport as inadecuate




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Abstract : The preparation of Ge-Si alloys by chemical vapour deposition has been undertaken using two organometallic compounds, H3Si-CH22-GeH3 and H3Si -CH23-GeH3. Their thermal behaviour was investigated by analysis of the gaseous products of decomposition and of the solid material. The thin coatings are composed of silicon , germanium and do not contain carbon. According to these results and physico-chemical characterizations of the precursors and the products, we are lead to propose a structure for the solid material.





Author: A. Reynes C. Dufor P. Mazerolles R. Morancho

Source: https://hal.archives-ouvertes.fr/



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