Characterization of thin films and multilayers by specular X-ray reflectivityReport as inadecuate




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Abstract : The application of glancing incidence X-ray reflectivity measurements for the investigation of submicrometer thick layers and multilayer stacks which are produced in modern technology processes is discussed. We describe different setups for X-ray reflectivity measurements and computer methods which allow the extraction of various layer parameters from the experimental data.





Author: W. Plotz K. Lischka

Source: https://hal.archives-ouvertes.fr/



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