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An analytical model describing the physical relations of a UV-based process for halogenation of polymeric surfaces is presented. The process allows, depending on the parameters, a local halogenation with sharp edges at the interfaces to areas where no halogenation is desired. This is achieved via a nonreactive halogen-containing gaseous precursor and a UV source providing photons which dissociate the precursor photolytically. Thus, only where the UV photons affect the precursor, halogens are generated and the polymer is being halogenated.

KEYWORDS

Local Surface Halogenation; Polymer Modification; UV-Laser-Based Surface Modification

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S. Kibben -Model for a UV Laser Based Local Polymer Surface Halogenation Process Using a Gaseous Precursor,- Modeling and Numerical Simulation of Material Science, Vol. 4 No. 1, 2014, pp. 14-19. doi: 10.4236-mnsms.2014.41003.





Author: Simon Kibben

Source: http://www.scirp.org/



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