Special Issue: 15 Years of SU8 as MEMS MaterialReport as inadecuate

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Microsystems Laboratory LMIS4, École Polytechnique Fédérale de Lausanne EPFL, Station 17, 1015 Lausanne, Switzerland


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Excerpt In 1997, the first paper using SU-8 as a material for microfabrication was published 1, demonstrating the interest of this negative photoresist for the near-UV structuration of thick layers and the manufacturing of high aspect-ratio components

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Author: Arnaud Bertsch * and Philippe Renaud

Source: http://mdpi.com/


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