Efficient energy transfer from Si-nanoclusters to Er ions in silica induced by substrate heating during depositionReport as inadecuate




Efficient energy transfer from Si-nanoclusters to Er ions in silica induced by substrate heating during deposition - Download this document for free, or read online. Document in PDF available to download.

1 CIMAP - UMR 6252 - Centre de recherche sur les Ions, les MAtériaux et la Photonique 2 MIND-IN2UB - Departament d-Electronica

Abstract : This study investigates the influence of the deposition temperature Td on the Si-mediated excitation of Er ions within silicon-rich silicon oxide layers obtained by magnetron cosputtering. For Td exceeding 200 °C, an efficient indirect excitation of Er ions is observed for all as-deposited samples. The photoluminescence intensity improves gradually up to a maximum at Td=600 °C before decreasing for higher Td values. The effects of this -growth-induced annealing- are compared to those resulting from the same thermal budget used for the -classical- approach of postdeposition annealing performed after a room temperature deposition. It is demonstrated that the former approach is highly beneficial, not only in terms of saving time but also in the fourfold enhancement of the Er photoluminescence efficiency.





Author: Sébastien Cueff - Christophe Labbé - Julien Cardin - Jean-Louis Doualan - Larysa Khomenkova - Khalil Hijazi - Olivier Jambois -

Source: https://hal.archives-ouvertes.fr/



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