Near-infrared optical absorption enhanced in black silicon via Ag nanoparticle-induced localized surface plasmonReport as inadecuate




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Nanoscale Research Letters

, 9:519

First Online: 22 September 2014Received: 29 August 2014Accepted: 13 September 2014

Abstract

Due to the localized surface plasmon LSP effect induced by Ag nanoparticles inside black silicon, the optical absorption of black silicon is enhanced dramatically in near-infrared range 1,100 to 2,500 nm. The black silicon with Ag nanoparticles shows much higher absorption than black silicon fabricated by chemical etching or reactive ion etching over ultraviolet to near-infrared UV-VIS-NIR, 250 to 2,500 nm. The maximum absorption even increased up to 93.6% in the NIR range 820 to 2,500 nm. The high absorption in NIR range makes LSP-enhanced black silicon a potential material used for NIR-sensitive optoelectronic device.

PACS78.67.Bf; 78.30.Fs; 78.40.-q; 42.70.Gi

KeywordsLSP Ag nanoparticles Black silicon Chemical etching Absorption Electronic supplementary materialThe online version of this article doi:10.1186-1556-276X-9-519 contains supplementary material, which is available to authorized users.

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Author: Peng Zhang - Shibin Li - Chunhua Liu - Xiongbang Wei - Zhiming Wu - Yadong Jiang - Zhi Chen

Source: https://link.springer.com/



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