en fr Initial stages of metal oxides thin films growth by MOCVD: physicochemical characterisation of the film-substrate interface Les premiers instants de la croissance de films minces doxydes métalliques par MOCVD : caractériReport as inadecuate




en fr Initial stages of metal oxides thin films growth by MOCVD: physicochemical characterisation of the film-substrate interface Les premiers instants de la croissance de films minces doxydes métalliques par MOCVD : caractéri - Download this document for free, or read online. Document in PDF available to download.

1 LRRS - Laboratoire de Recherche sur la Réactivité des Solides

Abstract : The initial stages of Metalorganic Chemical Vapour Deposition MOCVD of TiO2 thin films on Si100 were studied in situ by surface analyses XPS, ARXPS, AES. An original experimental set-up was built for this purpose and developed. Information obtained from these in situ experiments was completed by ex situ characterisations HRTEM, SIMS, GIXRD



The formation of an interfacial SiOy



Author: Aude Brevet -

Source: https://hal.archives-ouvertes.fr/



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